Dr. Andrew YACOOTH-Index: 27
National Physical Laboratory, Teddington, United Kingdom
Position: Principal scientist in the Dimensional Metrology Group leading the dimensional nanometrology work at the National Physical Laboratory (NPL), the UK’s national Metrology Institute.
Specialization: Dimensional nanometrology including: X-ray and Optical Interferometry, Nanopositioning and Quantitative Scanning Probe Microscopy.
At the NANOCON´26 Andrew Yacoot will present his invited talk “Traceability for SPM through the lattice parameter of silicon and bringing metrology to high-speed AFM” in the Session E – Advanced Methods of Preparation and Characterization of Nanomaterials.
Personal Background and Education:
Andrew Yacoot obtained his PhD in X-ray crystallography from Royal Holloway, University of London and then undertook post-doctoral research in X-ray microscopy at King’s College, University of London before joining NPL.
His initial NPL research was in the field of X-ray interferometry as a tool for dimensional nanometrology. He was seconded to PTB, the German National Metrology Institute where he continued this work and developed an atomic force microscope for the study of tip sample interactions.
He has participated in numerous European collaborative projects across the area of dimensional nanometrology and has a strong collaboration with the Nanometrology Group at the Czech Metrology Institute. He was instrumental in getting the lattice parameter of silicon adopted as a secondary realisation of the metre for dimensional nanometrology.
Andrew is a Fellow of the Institute of Physics and a Chartered Physicist. He is Editor in Chief for the Institute of Physics Journal Measurement Science and Technology and he chairs the International Bureau of Weights and Measures’ Consultative Committee for Length’s Working Group on Dimensional Nanometrology.
Research interests:
Andrew´s major research theme is the development of traceable dimensional nanometrology to support industrial and academic research. This includes interferometer capable of resolving extraordinarily small displacements, particularly X-ray interferometry, correction of errors in optical interferometers, nanopositioning, ultra-precise angle metrology and metrological atomic force microscopy.
In the field of AFM activities cover improving calibration of AFM instruments, reducing positioning errors, enabling traceable measurements during imaging. Optical interferometry has been integrated directly into a high-speed AFM providing real-time traceability without sacrificing speed and remove the need for complex image stitching algorithms.
Modern nanotechnology increasingly requires accurate nanopositioning, therefore he has developed a strong collaboration with a UK nanopositioning stage manufacturer to characterise and improve the performance of nanopositioning systems.
Summary of publication activity:
Author/co-author of over 70 papers in international peer-reviewed journals; The number of total citations >2.400 and H-index: 27 (Google Scholar, June, 2026); ORCID ID 
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